EUV resist simulation with rigorous mask computation and simplified resist modelsJOUVE, A; FUARD, D; FARYS, V et al.Microelectronic engineering. 2006, Vol 83, Num 4-9, pp 1111-1114, issn 0167-9317, 4 p.Conference Paper

Model-based mask verification on critical 45nm logic masksSUNDERMANN, F; FOUSSADIER, F; ARNOUX, V et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7028, pp 70280U.1-70280U.12, issn 0277-786X, isbn 978-0-8194-7243-4 0-8194-7243-3, 2Conference Paper

Quantification of the difference between two sources by Zernike polynomial decompositionALLEAUME, C; YESILADA, E; FARYS, V et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7973, issn 0277-786X, isbn 978-0-8194-8532-8, 79731Y.1-79731Y.7, 2Conference Paper

Study of SRAF Placement for Contact at 45 nm and 32 nm NodeFARYS, V; ROBERT, F; YESILADA, E et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 69242Z.1-69242Z.7, issn 0277-786X, isbn 978-0-8194-7109-3Conference Paper

Investigation on immersion defectivity root causeFARYS, V; GAUGIRAN, S; CRUAU, D et al.Proceedings of SPIE, the International Society for Optical Engineering. 2007, pp 653308.1-653308.8, issn 0277-786X, isbn 978-0-8194-6655-6Conference Paper

Improving double patterning flow by analyzing the diffractive orders in the pupil planeZEGGAOUI, N; FARYS, V; BESACIER, M et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7973, issn 0277-786X, isbn 978-0-8194-8532-8, 79730M.1-79730M.15, 2Conference Paper

Optimization of double patterning split by analyzing diffractive orders in the pupil planeZEGGAOUI, N; FARYS, V; TROUILLER, Y et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7823, issn 0277-786X, isbn 978-0-8194-8337-9, 78233Y.1-78233Y.8, 2Conference Paper

Convergence study for lines, spaces between standard OPC, local and more holistic OPCPERRAUD, L; TROUILLER, Y; YESILADA, E et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7969, issn 0277-786X, isbn 978-0-8194-8528-1, 79691P.1-79691P.8, 2Conference Paper

A systematic study of source error in source mask optimizationALLEAUME, C; YESILADA, E; FARYS, V et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7823, issn 0277-786X, isbn 978-0-8194-8337-9, 782312.1-782312.7, 2Conference Paper

The Measurement Uncertainty challenge for the future technological nodes production and developmentFOUCHER, J; FAURIE, P; FOUCHER, A.-L et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7272, issn 0277-786X, isbn 978-0-8194-7525-1 0-8194-7525-4, 72721K.1-72721K.9, 2Conference Paper

A new absorbing stack for EUV masksNICOLLE, C. Charpin; FARYS, V; BIASSE, B et al.SPIE proceedings series. 2004, pp 1417-1424, isbn 0-8194-5513-X, 2Vol, 8 p.Conference Paper

Enabling 22-nm Logic Node with Advanced RET SolutionsFARYS, V; DEPRE, L; FINDERS, J et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7973, issn 0277-786X, isbn 978-0-8194-8532-8, 79730T.1-79730T.12, 2Conference Paper

Grayscale lithography process study applied to zero-gap microlenses for sub 2μm CMOS image sensorsAUDRAN, S; VAILLANT, J; ARNAUD, O et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7639, issn 0277-786X, isbn 978-0-8194-8053-8 0-8194-8053-3, 763910.1-76391.11, 2Conference Paper

THE CD METROLOGY PERSPECTIVES AND FUTURE TRENDSFOUCHER, J; PARGON, E; MARTIN, M et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, Vol 7140, issn 0277-786X, isbn 978-0-8194-7381-3 0-8194-7381-2, 71400F.1-71400F.13, 2Conference Paper

Leaching mechanisms in immersion lithography with or without top coatGAUGIRAN, S; FEILLEUX, R; SOURD, C et al.Microelectronic engineering. 2007, Vol 84, Num 5-8, pp 1054-1057, issn 0167-9317, 4 p.Conference Paper